Al. Kholkin et al., Characterization of the effective electrostriction coefficients in ferroelectric thin films, J APPL PHYS, 89(12), 2001, pp. 8066-8073
Electromechanical properties of a number of ferroelectric films including P
bZrxTi1-xO3(PZT), 0.9PbMg(1/3)Nb(2/3)O(3)-0.1PbTiO(3)(PMN-PT), and SrBi2Ta2
O9(SBT) are investigated using laser interferometry combined with conventio
nal dielectric measurements. Effective electrostriction coefficients of the
films, Q(eff), are determined using a linearized electrostriction equation
that couples longitudinal piezoelectric coefficient, d(33), with the polar
ization and dielectric constant. It is shown that, in PZT films, electrostr
iction coefficients slightly increase with applied electric field, reflecti
ng the weak contribution of non-180 degrees domains to piezoelectric proper
ties. In contrast, in PMN-PT and SBT films electrostriction coefficients ar
e field independent, indicating the intrinsic nature of the piezoelectric r
esponse. The experimental values of Q(eff) are significantly smaller than t
hose of corresponding bulk materials due to substrate clamping and possible
size effects. Electrostriction coefficients of PZT layers are shown to dep
end strongly on the composition and preferred orientation of the grains. In
particular, Q(eff) of (100) textured rhombohedral films (x = 0.7) is signi
ficantly greater than that of (111) layers. Thus large anisotropy of the el
ectrostrictive coefficients is responsible for recently observed large piez
oelectric coefficients of (100) textured PZT films. Effective electrostrict
ion coefficients obtained by laser interferometry allow evaluation of the e
lectromechanical properties of ferroelectric films based solely on the diel
ectric parameters and thus are very useful in the design and fabrication of
microsensors and microactuators. (C) 2001 American Institute of Physics.