Yj. Wang et al., Micromagnetic simulation in two antiferromagnetically coupled ferromagnetic layers separated by a spacer, J APPL PHYS, 89(11), 2001, pp. 6994-6996
On the basis of a micromagnetic model, magnetization reversal in two antife
rromagnetically coupled ferromagnetic layers (10 nm t(1)/0.9 nmM/t(2) nm fi
lms with t(2) = 2, 3, 4, 5 nm, here t(1) and t(2) are the top and bottom la
yers, respectively, and M the spacer) with the same random anisotropy arran
gement can be represented by a computer simulation. The calculation indicat
es that the appearance of a full antiferromagnetic coupling at remanence re
quires the antiferromagnetic coupling constant j = -3.5 erg/cm(2) for the 1
0 nm t(1)/0.9 nmM/3 nm t(2), films and it needs a large j value if t(2) inc
reases for the case of K-u2 = K-u1 = 1 x 10(6) erg/cm(3) and M-s1 = M-s2 =
400 emu/cm(3). H-c follows the equation H-c = -0.755j/M(s)t(1) (j < 0). Why
the calculated H-c values deviate from H-c(max) = -j/M(s)t(1) is discussed
. (C) 2001 American Institute of Physics.