In-plane spin reorientation transitions in epitaxial Fe(110)/GaAs(110) films

Citation
R. Hollinger et al., In-plane spin reorientation transitions in epitaxial Fe(110)/GaAs(110) films, J APPL PHYS, 89(11), 2001, pp. 7136-7138
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
2
Pages
7136 - 7138
Database
ISI
SICI code
0021-8979(20010601)89:11<7136:ISRTIE>2.0.ZU;2-Q
Abstract
Epitaxial Fe films in a thickness range from 4 to 64 monolayers (ML) were g rown by molecular beam epitaxy on GaAs(110) at room temperature. The growth was characterized by reflection high energy electron diffraction. The magn etic in-plane anisotropy was investigated by alternating gradient magnetome try in a temperature range from 150 to 295 K. For a 64 ML thick Fe(110) fil m the [001] axis is the easy axis, the [-110] the intermediate axis, and th e hard axis is between [-110] and [-111]. For Fe films with a thickness bel ow 24.2 +/-1.2 ML the [-110] becomes an easy axis at room temperature. A 24 ML Fe film shows a reorientation of the easy axis with decreasing temperat ure: Above the critical temperature of (251 +/-3) K [-110] is the easy axis , for lower temperatures it becomes an intermediate axis. (C) 2001 American Institute of Physics.