Voltage-induced barrier-layer damage in spin-dependent tunneling junctions

Citation
D. Rao et al., Voltage-induced barrier-layer damage in spin-dependent tunneling junctions, J APPL PHYS, 89(11), 2001, pp. 7362-7364
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
2
Pages
7362 - 7364
Database
ISI
SICI code
0021-8979(20010601)89:11<7362:VBDIST>2.0.ZU;2-C
Abstract
The effect of a dc stress voltage on the junction resistance and magnetores istance (MR) of spin-dependent tunneling (SDT) junctions with naturally oxi dized barriers was investigated. There is a threshold voltage at which irre versible resistance change begins. Beyond this threshold, device resistance decreases gradually over a transition period prior to breakdown of the tun neling barrier. The onset voltage of irreversible resistance change is much higher than the optimum operating voltage of SDT heads having the precurso r aluminum thicknesses here investigated (5-11 Angstrom). The MR ratio decr eased with increasing stress voltage in a pattern similar to that of the ju nction resistance. (C) 2001 American Institute of Physics.