Tunnel magnetoresistance on ferromagnetic single-electron transistors withmultiple tunnel junction

Citation
J. Shirakashi et Y. Takemura, Tunnel magnetoresistance on ferromagnetic single-electron transistors withmultiple tunnel junction, J APPL PHYS, 89(11), 2001, pp. 7365-7367
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
2
Pages
7365 - 7367
Database
ISI
SICI code
0021-8979(20010601)89:11<7365:TMOFST>2.0.ZU;2-D
Abstract
Single-electron transistors with ferromagnetic multiple tunnel junctions ar e studied theoretically. Tunnel magnetoresistance under the Coulomb blockad e regime is modulated by the gate voltage and is increased with increasing the number of tunnel junctions. Higher-order tunneling processes, especiall y for inelastic macroscopic quantum tunneling of charge, play an important role in the enhancement of the tunnel magnetoresistance. This implies that the tunnel magnetoresistance of the ferromagnetic single-electron transisto r could be controlled by the gate and drain voltages and the number of the tunnel junctions. (C) 2001 American Institute of Physics.