The spin-valve transistor: Fabrication, characterization, and physics (invited)

Citation
R. Jansen et al., The spin-valve transistor: Fabrication, characterization, and physics (invited), J APPL PHYS, 89(11), 2001, pp. 7431-7436
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
2
Pages
7431 - 7436
Database
ISI
SICI code
0021-8979(20010601)89:11<7431:TSTFCA>2.0.ZU;2-1
Abstract
An overview is given of the fabrication, basic properties, and physics of t he spin-valve transistor. We describe the layout of this three-terminal fer romagnet/semiconductor hybrid device, as well as the operating principle. F abrication technologies are discussed, including vacuum metal bonding. We c haracterize properties of the device relevant for possible applications in magneto-electronics, such as relative magnetic response, output current, an d noise behavior. Furthermore, we illustrate the unique possibilities of th e spin-valve transistor for fundamental studies of the physics of hot-elect ron spin transport in magnetic thin film structures. (C) 2001 American Inst itute of Physics.