Strain effects in thin films of CrO2 on rutile and sapphire substrates

Citation
Pa. Stampe et al., Strain effects in thin films of CrO2 on rutile and sapphire substrates, J APPL PHYS, 89(11), 2001, pp. 7696-7698
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
2
Pages
7696 - 7698
Database
ISI
SICI code
0021-8979(20010601)89:11<7696:SEITFO>2.0.ZU;2-H
Abstract
Detailed x-ray diffraction characterizations were made of chromium dioxide films fabricated by chemical vapor deposition onto (100) and (110) oriented TiO2 and (0001) Al2O3 substrates. Pole figures were used to examine the ep itaxy of these systems, and the lattice parameters were calculated using x- ray area maps. The film on (100) TiO2 exhibits the best epitaxy of the thre e; however, it is significantly strained relative to bulk CrO2. The film on (110) TiO2 is distorted from the ideal tetragonal structure by 0.17 degree s in the angle between the a and b lattice directions, and also exhibits si gnificant mosaicity. The film on sapphire contains crystallites that have g rown in three in-plane orientations, but exhibit the best rocking curve wid ths and the least degree of strain of the films studied. Magnetization and magnetotransport measurements are shown to demonstrate effects of strain an d crystalline structure on the physical properties of these films. (C) 2001 American Institute of Physics.