Xq. Pan et al., Structure-property relationship of nanocrystalline tin dioxide thin films grown on ((1)over-bar012) sapphire, J APPL PHYS, 89(11), 2001, pp. 6056-6061
This work demonstrates the correlation between the microstructure of nanocr
ystalline SnO2 thin films and their electrical transport properties and sen
sitivities to reducing gases. SnO2 thin films were deposited on the ((1) ov
er bar 012) surface of alpha -Al2O3 (sapphire) using electron beam evaporat
ion of a pure SnO2 ceramic source, followed by postdeposition annealing in
synthetic air. SnO2 thin films with randomly oriented nanosized grains were
obtained by annealing an amorphous SnO film deposited at room temperature.
Films with nanosized SnO2 laminates were obtained by annealing epitaxial a
lpha -SnO films deposited at 600 degreesC. The laminates are oriented with
their (101) planes parallel to the substrate surface and have a high densit
y of coherent twin boundaries. Hall measurements indicate that the electron
concentration of the film with laminate grains is much lower than for the
film with random grains. It is proposed that the high density twin boundari
es inside the laminates trap conducting electrons and significantly reduce
the electron concentration. As a result, the sensitivity to reducing gases
of the laminar film is higher than that of the corresponding film with rand
omly oriented SnO2 grains. It was also found that the grain size has strong
effects on the sensitivity of SnO2 films. (C) 2001 American Institute of P
hysics.