Donor and acceptor concentration dependence of the electron Hall mobility and the Hall scattering factor in n-type 4H-and 6H-SiC

Authors
Citation
H. Iwata et Km. Itoh, Donor and acceptor concentration dependence of the electron Hall mobility and the Hall scattering factor in n-type 4H-and 6H-SiC, J APPL PHYS, 89(11), 2001, pp. 6228-6234
Citations number
37
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
1
Pages
6228 - 6234
Database
ISI
SICI code
0021-8979(20010601)89:11<6228:DAACDO>2.0.ZU;2-K
Abstract
Theoretical calculation of the electron Hall mobility and the Hall scatteri ng factor in 4H- and 6H-SiC is performed based on the low-field transport m odel. Our mobility calculation as a function of temperature, net-doping con centration ([N-D]-[N-A]), and compensation ratio ([N-A]/[N-D]), where N-D a nd N-A are the donor (nitrogen) and acceptor concentrations, respectively, provides the theoretical values of the electron Hall mobility expected for the high quality SiC crystal. The results can be used for the evaluation of the crystalline quality of a given SiC sample. We also present the ratio o f the Hall and drift mobility, i.e., the Hall scattering factor, which is n eeded to make a bridge between the experimentally measured Hall mobility an d the theoretically calculated drift mobility using, for example, Monte Car lo simulation. Our calculations of both the electron Hall mobility and the Hall scattering factor are in very good agreement with the experimental res ults. (C) 2001 American Institute of Physics.