H. Iwata et Km. Itoh, Donor and acceptor concentration dependence of the electron Hall mobility and the Hall scattering factor in n-type 4H-and 6H-SiC, J APPL PHYS, 89(11), 2001, pp. 6228-6234
Theoretical calculation of the electron Hall mobility and the Hall scatteri
ng factor in 4H- and 6H-SiC is performed based on the low-field transport m
odel. Our mobility calculation as a function of temperature, net-doping con
centration ([N-D]-[N-A]), and compensation ratio ([N-A]/[N-D]), where N-D a
nd N-A are the donor (nitrogen) and acceptor concentrations, respectively,
provides the theoretical values of the electron Hall mobility expected for
the high quality SiC crystal. The results can be used for the evaluation of
the crystalline quality of a given SiC sample. We also present the ratio o
f the Hall and drift mobility, i.e., the Hall scattering factor, which is n
eeded to make a bridge between the experimentally measured Hall mobility an
d the theoretically calculated drift mobility using, for example, Monte Car
lo simulation. Our calculations of both the electron Hall mobility and the
Hall scattering factor are in very good agreement with the experimental res
ults. (C) 2001 American Institute of Physics.