Magnetoresistance of manganite thin films induced by reaction with substrate

Citation
K. Hamaya et al., Magnetoresistance of manganite thin films induced by reaction with substrate, J APPL PHYS, 89(11), 2001, pp. 6320-6323
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
1
Pages
6320 - 6323
Database
ISI
SICI code
0021-8979(20010601)89:11<6320:MOMTFI>2.0.ZU;2-3
Abstract
Enhanced low-field magnetoresistance (MR) of polycrystalline lanthanum stro ntium manganite thin films is demonstrated using an approach in which effec tive barriers are formed by the heat-treatment induced reaction with an ins ulating substrate. The heat treatment induces two chemically different proc esses in the film, i.e., grain growth and chemically reactive penetration. In the former process, the MR decreases due to reduction of the number of g rain boundaries, while in the latter the penetration of an insulating subst rate and reacted materials forms effective barriers for the electron tunnel ing between ferromagnetic grains. The formation of effective barriers cause s a factor of 3 larger MR than as-prepared films. These results suggest tha t the MR can be prospectively controlled in this fashion. (C) 2001 American Institute of Physics.