Gain limitations of scaled InP/InGaAs heterojunction bipolar transistors

Citation
M. Rohner et al., Gain limitations of scaled InP/InGaAs heterojunction bipolar transistors, J APPL PHYS, 89(11), 2001, pp. 6444-6448
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
1
Pages
6444 - 6448
Database
ISI
SICI code
0021-8979(20010601)89:11<6444:GLOSIH>2.0.ZU;2-8
Abstract
We investigate a current gain degradation mechanism in self-aligned InP/InG aAs heterojunction bipolar transistors. We show that surface level pinning at the emitter sidewall gives rise to a peripheral emitter injection curren t into the base which increases the base current due to electrons recombini ng at the base contacts. The surface charge at the extrinsic base surface c auses the formation of a conducting channel which further enhances the elec tron flow from the emitter to the base contacts. Two-dimensional numerical simulations of the emitter region combined with Monte-Carlo simulations of the injection process at the abrupt base-emitter heterojunction are in good agreement with the measurements. This effect will be especially severe for submicron emitter widths where the emitter perimeter to emitter area ratio is large. (C) 2001 American Institute of Physics.