Jl. Masson et al., Pattern formation and evolution in diblock copolymer thin films above the order-disorder transition, J CHEM PHYS, 114(24), 2001, pp. 10963-10967
Research on diblock copolymer thin films has been devoted primarily toward
understanding and controlling microstructural and topographical features at
temperatures below the order-disorder transition (ODT), where ordered phas
e separated structures exist. Recently, we showed that the topography of th
in liquid diblock films above the ODT form a hierarchy of patterns, dependi
ng on the film thickness. One of these topographies is a "spinodal-like" pa
ttern. Through the use of a pair correlation analysis we show that the stru
ctural evolution of this pattern is characterized by four stages. The first
involves the amplification of surface perturbations, followed by the forma
tion of an interconnected, "spinodal-like," pattern. The onset of the third
stage is associated with the breakup of the interconnected pattern and the
eventual formation of droplets of irregular shapes. The final stage involv
es evolution toward the formation of circular droplets. (C) 2001 American I
nstitute of Physics.