Interfacial embrittlement by bismuth segregation in copper/tin-bismuth Pb-free solder interconnect

Authors
Citation
Pl. Liu et Jk. Shang, Interfacial embrittlement by bismuth segregation in copper/tin-bismuth Pb-free solder interconnect, J MATER RES, 16(6), 2001, pp. 1651-1659
Citations number
32
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
16
Issue
6
Year of publication
2001
Pages
1651 - 1659
Database
ISI
SICI code
0884-2914(200106)16:6<1651:IEBBSI>2.0.ZU;2-K
Abstract
Microchemistry and mechanical properties of a copper/tin-bismuth Pb-free so lder interconnect were examined in the as-reflowed and aged conditions by i n situ Auger fracture and interface fracture mechanics techniques. In the a s-reflowed condition, the solder-copper interface was highly resistant to f racture, and the fracture mechanism was ductile with the crack path followi ng the interface between the solder alloy and the copper-tin intermetallic phase. Upon thermal aging, bismuth segregation was found to occur on the co pper-intermetallic interface. Auger depth profiling indicated that the segr egation was confined to about one monolayer from the interface. The segrega tion was shown to embrittle the interface, resulting in an approximately 5- fold decrease in the interfacial fracture resistance.