Es. Etz et al., Correlation of the Raman spectra with the thermal conductivity of a set ofdiamond wafers prepared by chemical vapor deposition, J MATER RES, 16(6), 2001, pp. 1694-1711
Raman spectroscopy, at laser excitation wavelengths of 514.5, 785, and 1064
nm, is used to study a set of chemical-vapor-deposited (CVD) diamond wafer
s of known thermal conductivity kappa. The in-plane thermal conductivity (a
t 25 degreesC) of the diamond wafers ranges from 4 to 22 W cm(-1) K-1 and r
epresents a wide range of diamond quality. The spectra were obtained from b
oth macro/micro- sampling measurements, examining the top and bottom wafer
surface, as well as wafer cross-sections. Discussed are the peak positions
and linewidths of the Raman bands and their relation to sp(3)-bonded diamon
d and sp(2)-bonded carbon in the context of diamond quality and perfection,
and the effects of wafer heterogeneities. The detailed analysis of the Ram
an spectra provides a robust correlation with the room-temperature bulk (or
macroscopic) thermal conductivity of these samples. The correlation is mad
e through the determination of the band area ratios of the diamond Raman li
ne at 1333 cm(-1) to that of the 1550 cm(-1) band characteristic of nondiam
ond carbon impurities. This dependence is most pronounced for the Fourier-t
ransform Raman data obtained with infrared excitation at 1064 nm, due to re
sonance enhancement, and therefore allows the detection of carbon impuritie
s, especially for high-quality CVD diamond.