Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitrid
e (a-SiOxNy) thin films of various compositions as well as the atmospheric
pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG
) thin films with varying phosphorus and boron contents were investigated.
The dependence of the optical properties of the films on the deposition tem
perature and the gas flow ratio was studied by spectroellipsometry (SE) and
infrared spectroscopy (IR). (C) 2001 Elsevier Science B.V. All rights rese
rved.