Investigation on optical properties of CVD films used in MOEMS applications

Citation
M. Modreanu et M. Gartner, Investigation on optical properties of CVD films used in MOEMS applications, J MOL STRUC, 565, 2001, pp. 519-523
Citations number
15
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF MOLECULAR STRUCTURE
ISSN journal
00222860 → ACNP
Volume
565
Year of publication
2001
Pages
519 - 523
Database
ISI
SICI code
0022-2860(20010530)565:<519:IOOPOC>2.0.ZU;2-V
Abstract
Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitrid e (a-SiOxNy) thin films of various compositions as well as the atmospheric pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG ) thin films with varying phosphorus and boron contents were investigated. The dependence of the optical properties of the films on the deposition tem perature and the gas flow ratio was studied by spectroellipsometry (SE) and infrared spectroscopy (IR). (C) 2001 Elsevier Science B.V. All rights rese rved.