Gg. Totir et al., Electrofluorination of hexafluorobutanol in anhydrous hydrofluoric acid - Quasi on line mass spectrometry and X-ray photoelectron spectroscopy studies, J ELCHEM SO, 148(6), 2001, pp. E262-E266
Certain aspects of the electrochemical fluorination (ECF) of hexafluorobuta
nol (HFB) in anhydrous HF (AHF) on Ni electrodes have been examined by mass
spectrometry (MS) and X-ray photoelectron spectroscopy (XPS). Measurements
were performed using a portable ultrahigh vacuum compatible chamber that a
llows for the transfer and characterization of specimens without exposure t
o the ambient atmosphere. Quasi on line MS analysis of the gases released d
uring ECF of HFB/AHF solutions revealed features attributable to perfluorob
utyryl fluoride [PBF = CF3CF2CF2C(O)F] with no evidence of the presence of
other reaction products. Ex situ XPS analysis of Ni electrodes following EC
F yielded spectra consistent with the formation of a rather thick, irregula
r layer of NiF2 of average thickness of about 150-200 monolayers, with smal
l contributions due to O (6% ) and C (7%) localized primarily in the surfac
e region. (C) 2001 The Electrochemical Society.