Electrofluorination of hexafluorobutanol in anhydrous hydrofluoric acid - Quasi on line mass spectrometry and X-ray photoelectron spectroscopy studies

Citation
Gg. Totir et al., Electrofluorination of hexafluorobutanol in anhydrous hydrofluoric acid - Quasi on line mass spectrometry and X-ray photoelectron spectroscopy studies, J ELCHEM SO, 148(6), 2001, pp. E262-E266
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
6
Year of publication
2001
Pages
E262 - E266
Database
ISI
SICI code
0013-4651(200106)148:6<E262:EOHIAH>2.0.ZU;2-X
Abstract
Certain aspects of the electrochemical fluorination (ECF) of hexafluorobuta nol (HFB) in anhydrous HF (AHF) on Ni electrodes have been examined by mass spectrometry (MS) and X-ray photoelectron spectroscopy (XPS). Measurements were performed using a portable ultrahigh vacuum compatible chamber that a llows for the transfer and characterization of specimens without exposure t o the ambient atmosphere. Quasi on line MS analysis of the gases released d uring ECF of HFB/AHF solutions revealed features attributable to perfluorob utyryl fluoride [PBF = CF3CF2CF2C(O)F] with no evidence of the presence of other reaction products. Ex situ XPS analysis of Ni electrodes following EC F yielded spectra consistent with the formation of a rather thick, irregula r layer of NiF2 of average thickness of about 150-200 monolayers, with smal l contributions due to O (6% ) and C (7%) localized primarily in the surfac e region. (C) 2001 The Electrochemical Society.