A Bergman cyclization approach to polymers for thin-film lithography

Authors
Chen, XH Tolbert, LM Hess, DW Henderson, C
Citation
Xh. Chen et al., A Bergman cyclization approach to polymers for thin-film lithography, MACROMOLEC, 34(12), 2001, pp. 4104-4108
Citations number
20
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
MACROMOLECULES
ISSN journal
00249297 → ACNP
Volume
34
Issue
12
Year of publication
2001
Pages
4104 - 4108
Database
ISI
SICI code
0024-9297(20010605)34:12<4104:ABCATP>2.0.ZU;2-I
Abstract
A new polymer, poly(3,4-bis(phenylethynyl)styrene), has been synthesized th at undergoes a Bergman reaction upon heating to yield a highly aromatic mat erial. The occurrence of the cycloaromatization reaction is characterized t hrough thermal analysis and absorption spectroscopy. The plasma etch resist ance of the polymer has been measured by reactive ion etching (RIE) in sulf ur hexafluoride and oxygen plasmas and is shown to be superior to other con ventional organic plasma etch barriers.