Citation
M. Izaki et al., Low temperature deposition of cerium dioxide film by chemical reaction, J MAT CHEM, 11(8), 2001, pp. 1972-1974
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS CHEMISTRY
ISSN journal
09599428
→ ACNP
Volume
11
Issue
8
Year of publication
2001
Pages
1972 - 1974
Database
ISI
SICI code
0959-9428(2001)11:8<1972:LTDOCD>2.0.ZU;2-2
Abstract
A cerium dioxide (CeO2) film with characteristic cubic lattice and optical
band gap energy has been deposited chemically onto a non-conductive glass s
ubstrate at 333 K by simple immersion into an aqueous solution containing h
ydrous cerium(III) nitrate and dimethylamineborane (DMAB).