Cathodic electrodeposition and analysis of SnS films for photoelectrochemical cells

Citation
B. Subramanian et al., Cathodic electrodeposition and analysis of SnS films for photoelectrochemical cells, MATER CH PH, 71(1), 2001, pp. 40-46
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS CHEMISTRY AND PHYSICS
ISSN journal
02540584 → ACNP
Volume
71
Issue
1
Year of publication
2001
Pages
40 - 46
Database
ISI
SICI code
0254-0584(20010801)71:1<40:CEAAOS>2.0.ZU;2-N
Abstract
Thin films of p-SnS were cathodically electrodeposited on tin oxide conduct ing glass substrates from aqueous solution containing SnCl2 and Na2S2O3. Th e mechanism of electrochemical co-deposition of tin and sulphur is investig ated by cyclic voltammetry. Deposits have been characterised with X-ray dif fractograms,, microstructure analysis, chemical analysis, optical and elect rical measurements. The films were found to be polycrystalline with an opti cal. energy gap of 1.15eV. Mott-Schottky plot has been drawn tin the dark c ondition) to evaluate the semiconductor parameters. A photoelectrochemical cell with the configuration of p-SnSIFe3+, Fe2+IPt yielded a short-circuit current density of 0.65 mA cm(-2), an open-circuit voltage of 320 mV under 100 mW cm(-2) illumination. (C) 2001 Elsevier Science B.V. All rights reser ved.