Studies on large area (similar to 50 cm(2)) MoS2 thin films deposited using successive ionic layer adsorption and reaction (SILAR) method

A simple method, successive ionic layer adsorption and reaction (SILAR), ha s been used to deposit MoS2 thin films onto various substrates using ammoni um molybdate and sodium sulfide as cation and anion precursor solutions, re spectively. Preparative parameters such as concentration, pH and temperatur e of cation and anion precursor solutions and adsorption, reaction and rins ing time durations were optimized to gee good quality films. The firms were deposited onto microsolide glass, fluorine doped tin oxide (FTO) coated gl ass and Si (1 1 1)wafer substrates. The versatility of the method was check ed by depositing the films onto (similar to 50 cm(2)) glass substrates. X-r ay diffraction, optical absorption, electrical resistivity and thermoemf me asurement techniques were used for characterization of the films. (C) 2001 Elsevier Science B.V All rights reserved.