It is proposed that the electronic straggling of projectile ion beams for m
edium energy ion scattering spectroscopy (MEIS) can be estimated with delta
-doped multilayers. From the depth dependence of the full width half maximu
m (FWHM) of the Ta peak of a Ta delta-doped Si multilayer, the electronic s
traggling of 100 keV H+ in Si could be estimated. The electronic straggling
can be estimated without information on the exact thickness and the interf
ace abruptness of the Ta delta-doped multilayers. The reduced electronic st
raggling, Omega (e)/Omega (B) was estimated to be 0.59. With the experiment
ally determined electronic straggling, the thickness of the Ta delta layer
could be estimated and compared with the nominal thickness based on the gro
wth rate determined by transmission electron microscopy (TEM). (C) 2001 Els
evier Science B.V. All rights reserved.