The alpha process (segmental motion) of thin polystyrene films supported on
glass substrate has been investigated in a wider frequency range from 10(-
3) Hz to 10(4) Hz using dielectric relaxation spectroscopy and thermal expa
nsion spectroscopy. The relaxation rate of the alpha process increases with
decreasing film thickness at a given temperature above the glass transitio
n. This increase in the relaxation rate with decreasing film thickness is m
uch more enhanced near the glass transition temperature. The glass transiti
on temperature determined as the temperature at which the relaxation time o
f the alpha process becomes a macroscopic time scale shows a distinct molec
ular weight dependence. It is also found that the Vogel temperature has a t
hickness dependence. i.e., the Vogel temperature decreases with decreasing
film thickness. The expansion coefficient of the free volume alpha (f) is e
xtracted from the temperature dependence of the relaxation time within the
free volume theory. The fragility index m is also evaluated as a function o
f thickness. Both alpha (f) and m are found to decrease with decreasing him
thickness.