Local microwave characterization of metal films using a scanning microwavenear-field microscope

Citation
L. Liu et al., Local microwave characterization of metal films using a scanning microwavenear-field microscope, SOL ST COMM, 119(3), 2001, pp. 133-135
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
119
Issue
3
Year of publication
2001
Pages
133 - 135
Database
ISI
SICI code
0038-1098(2001)119:3<133:LMCOMF>2.0.ZU;2-1
Abstract
In microwave integrated circuits, the performance of devices is often influ enced by the homogeneity of microwave properties of metal thin films in the circuits. In this paper, a scanning microwave near-field microscope (SMNFM ) has been designed using a coaxial resonator as the probe, to study the lo cal microwave properties of the electronic devices. Several typical samples of metal films have been measured and the results have shown that we can i mage the local microwave properties by recording the changes of the resonan t frequency and quality factor of the coaxial resonator probe. The spatial resolution of the SMNFM has been improved to be better than 5 mum by utiliz ing a probe with a structure similar to that used in a scanning tunnelling microscope. To demonstrate the ability of local microwave characterization, the surface resistances of Cr thin film and Ag/Cr multilayer have been ima ged by the SMNFM. (C) 2001 Elsevier Science Ltd. All rights reserved.