Effect of the target surface temperature on the distribution of nanoparticles formed by ion implantation

Citation
Al. Stepanov et al., Effect of the target surface temperature on the distribution of nanoparticles formed by ion implantation, TECH PHYS L, 27(7), 2001, pp. 554-556
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS LETTERS
ISSN journal
10637850 → ACNP
Volume
27
Issue
7
Year of publication
2001
Pages
554 - 556
Database
ISI
SICI code
1063-7850(2001)27:7<554:EOTTST>2.0.ZU;2-9
Abstract
Metal-nanoparticle-containing composite layers were synthesized by implanta tion of 60 keV Ag+ ions into a soda-lime silicate glass to a dose of 3 x 10 (16) ion/cm(2) at an ion beam current density of 3 muA/cm(2) and a substrat e temperature of 35 degreesC. The results of implantation depend on the tem perature effects developed in the glass targets of various thicknesses. Dat a on the silver distribution profile and the nucleation and growth of metal nanoparticles in depth of the implanted layers were obtained from the opti cal reflection spectra. It is demonstrated that even small variations in th e surface temperature of the ion-bombarded glass substrate lead to signific ant changes in the conditions of nanoparticle formation in the sample. (C) 2001 MAIK "Nauka/Interperiodica".