RESONANT INTERBAND TUNNELING CURRENT IN INAS ALSB/GASB/ALSB/INAS DIODES WITH EXTREMELY THIN ALSB BARRIER LAYERS/

Citation
H. Kitabayashi et al., RESONANT INTERBAND TUNNELING CURRENT IN INAS ALSB/GASB/ALSB/INAS DIODES WITH EXTREMELY THIN ALSB BARRIER LAYERS/, Applied physics letters, 71(4), 1997, pp. 512-514
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
71
Issue
4
Year of publication
1997
Pages
512 - 514
Database
ISI
SICI code
0003-6951(1997)71:4<512:RITCII>2.0.ZU;2-Y
Abstract
We have investigated the resonant interband tunneling current in InAs/ AlSb/GaSb/AlSb/InAs double-barrier resonant interband tunneling diodes with extremely thin AlSb barriers. Although no negative differential resistance (NDR) was observed for the diode without AlSb barrier layer s, NDR appeared when 0.5-monolayer(ML)-thick AlSb barrier layers were inserted. As the thickness of AlSb barriers (L-b) increased from 0.5 t o 2 ML, the difference between the peak current density and the valley current density increased. This result indicates the crucial role of the extremely thin AlSb barrier layers that are responsible for the re sonance level and move it up toward the GaSb valence-band edge with an increase in L-b. (C) 1997 American Institute of Physics.