Rf magnetron sputtering of polytetrafluoroethylene under various conditions

Deposition of fluorocarbon plasma polymer films by means of rf sputtering o f polytetrafluoroethylene (PTFE) has been performed in argon, nitrogen and in a self-sputtering mode. The average temperature of the target was found to be below the melting point of PTFE. Energy resolved mass spectrometry re vealed the differences between the cases of argon and nitrogen working gase s. The CFN compound and increased concentration of CFx fragments were obser ved in the plasma using N-2. High resolution XPS analysis revealed CN in th ese films and enhanced amount of CF2 groups. Wettability by means of contac t angle of water droplet was assessed. Static contact angles approaching 10 5 degrees and 100 degrees were measured for fluorocarbon plasma polymer fil ms sputtered in argon and nitrogen, respectively. (C) 2001 Elsevier Science B.V. All rights reserved.