A. Kloppel et al., Influence of substrate temperature and sputtering atmosphere on electricaland optical properties of double silver layer systems, THIN SOL FI, 392(2), 2001, pp. 311-314
A new method for the preparation of double silver layer systems with ultra-
low resistance and high visible transmittance for use as low-emissivity (lo
w -E) coatings, low resistance transparent electrodes for display applicati
ons and also electromagnetic interference (EMI) shieldings in plasma displa
y panel (PDP) applications has been successfully developed. in this paper,
the results of an optimization of the deposition conditions of both oxide l
ayers and metallic layers using indium-tin oxide (ITO) and indium-cerium ox
ide (ICO) as transparent oxides and a silver alloy as a metallic layer are
illustrated. (C) 2001 Elsevier Science B.V. All rights reserved.