Influence of substrate temperature and sputtering atmosphere on electricaland optical properties of double silver layer systems

Citation
A. Kloppel et al., Influence of substrate temperature and sputtering atmosphere on electricaland optical properties of double silver layer systems, THIN SOL FI, 392(2), 2001, pp. 311-314
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
392
Issue
2
Year of publication
2001
Pages
311 - 314
Database
ISI
SICI code
0040-6090(20010730)392:2<311:IOSTAS>2.0.ZU;2-A
Abstract
A new method for the preparation of double silver layer systems with ultra- low resistance and high visible transmittance for use as low-emissivity (lo w -E) coatings, low resistance transparent electrodes for display applicati ons and also electromagnetic interference (EMI) shieldings in plasma displa y panel (PDP) applications has been successfully developed. in this paper, the results of an optimization of the deposition conditions of both oxide l ayers and metallic layers using indium-tin oxide (ITO) and indium-cerium ox ide (ICO) as transparent oxides and a silver alloy as a metallic layer are illustrated. (C) 2001 Elsevier Science B.V. All rights reserved.