Electrical characterization of nanocrystalline carbon-silicon heterojunctions

Citation
Na. Hastas et al., Electrical characterization of nanocrystalline carbon-silicon heterojunctions, APPL PHYS L, 79(5), 2001, pp. 638-640
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
5
Year of publication
2001
Pages
638 - 640
Database
ISI
SICI code
0003-6951(20010730)79:5<638:ECONCH>2.0.ZU;2-G
Abstract
Nanocrystalline carbon (nc-C) films were grown by magnetron sputtering on n -type Si substrates at room temperature and at substrate bias voltage -200 V. The electrical transport properties of nc-C/n-Si heterojunctions are inv estigated by current-voltage measurements at various temperatures and capac itance-voltage measurements at room temperature. The results indicate that the forward conduction is determined by thermionic emission over a potentia l barrier of height 0.3 eV at temperatures above 180 K. At lower temperatur es and low currents, multistep tunneling current dominates. At low reverse voltages, the reverse conduction is dominated by current generated within t he depletion region, while at higher voltages the current is due to Poole-F renkel emission. (C) 2001 American Institute of Physics.