Selective adsorption and patterning of Si nanoparticles fabricated by laser ablation on functionalized self-assembled monolayer

Citation
K. Hata et al., Selective adsorption and patterning of Si nanoparticles fabricated by laser ablation on functionalized self-assembled monolayer, APPL PHYS L, 79(5), 2001, pp. 692-694
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
5
Year of publication
2001
Pages
692 - 694
Database
ISI
SICI code
0003-6951(20010730)79:5<692:SAAPOS>2.0.ZU;2-X
Abstract
We demonstrate an in situ selective adsorption of Si nanoparticles fabricat ed by laser ablation on a functionalized self-assembled monolayer (SAM). Si nanoparticles adsorbed on -CH3 terminated a SAM while Si particles did not adsorb on -NH2, -F, -OH, and -COOH, terminated SAMs. The end group of a SA M solely determines the selectivity against Si nanoparticle adsorption. We utilized the screening ability of functionalized SAMs to pattern Si nanopar ticles onto desired locations on a Si substrate. (C) 2001 American Institut e of Physics.