In recent years the field for miniaturised micro-fluidic devices such as mi
niaturised GC, HPLC, CE and CEC as well as micro-reactors and micro-mixers
has grown rapidly. Therefore, technologies to build new devices faster and
cheaper has become increasingly important. The classic production technique
for glass or silicon is photolithography followed by wet etching. Major ti
me and cost factors in this process are the production of lithography masks
. A process to design masks based on printouts on office printers and photo
graphic reduction was therefore developed.