Patterned growth and field emission properties of vertically aligned carbon nanotubes

Citation
Yc. Choi et al., Patterned growth and field emission properties of vertically aligned carbon nanotubes, DIAM RELAT, 10(8), 2001, pp. 1457-1464
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
10
Issue
8
Year of publication
2001
Pages
1457 - 1464
Database
ISI
SICI code
0925-9635(200108)10:8<1457:PGAFEP>2.0.ZU;2-8
Abstract
Vertically aligned carbon nanotubes were grown selectively on patterned Ni thin films by microwave plasma-enhanced chemical vapor deposition and their field emission properties were investigated using a diode-structure. Ni th in films patterned with a form of dot-arrays were prepared using a shadow m ask having an array of holes. The nanotubes were found to be well-graphitiz ed with multiwalled structures. The measurements of field emission properti es revealed that the carbon nanotube tips emitted high current density at l ow macroscopic electric field. The Fowler-Nordheim (F-N) plot clearly showe d two characteristic regions where the current saturates at the high electr ic field region. It was found that the saturation behavior was caused by th e adsorbates-enhanced field emission mechanism. Eliminating the adsorbates resulted in no saturation behavior, increasing turn-on field, decreasing cu rrent, and increasing field enhancement factor. Using ZnS/Cu,Al phosphor, v ery bright and uniform emission patterns were obtained. (C) 2001 Elsevier S cience B.V. Adl rights reserved.