For Silicon Carbide (SiC) high-voltage rectifier diodes, contradictions app
ear when the most important parameter of the diodes, the minority carrier l
ifetime, is measured by different techniques. A qualitative analysis and a
computer simulation have been carried out to clarify the origin of these co
ntradictions. For 4H-SiC p(+) n diodes with 6-kV blocking capability, data
on residual voltage drop at high current densities, switch-on time, reverse
current recovery, and post-injection voltage decay are analyzed. It is sho
wn that the whole set of experimental data can be explained by the existenc
e of a thin (l similar to 0.1 mum) layer near the metallurgical boundary of
the p+ n junction with very small carrier lifetime eta that is essentially
smaller than the carrier lifetime tau across the remaining part of the 50-
mum n-base, It is emphasized that the existence of such a layer allows, und
er certain conditions, the combination of a relatively Low residual forward
voltage drop and very fast reverse recovery. Approaches to minority carrie
r lifetime measurements are discussed.