Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) is often consider
ed synonymous with SIMS in the static limit where the ion fluence on the sa
mple surface is so low that damage is negligible. For this same reason, its
use in measuring isotopic ratios has generally been ruled out. However, th
e high-spatial-resolution Ga+ ion beams typically used in ToF-SIMS make it
a potentially attractive technique for the isotopic characterization of sma
ll features such as particles. We have developed a technique to measure iso
topic ratios by ToF-SIMS with a spatial resolution of < 1 Am. Peak-fitting
and interference-stripping algorithms have been developed and are presented
in this work. The precision of the measurements is close to counting stati
stical limits, and the variability in mass bias is comparable to dynamic SI
MS. (C) 2001 Elsevier Science B.V.