A procedure is presented for modelling the axial divergence aberration prof
ile, taking into account all second-order and end effects of the diffractom
eter system. It is shown that relatively simple calculations, which could b
e introduced into Rietveld refinement programs, allow the instrument line p
rofile to be modelled accurately at low and high scattering angles. This mo
del compares well with ray-tracing calculations and can give better results
than the usually used model proposed by Van Laar & Yelon [J. Appl. Cryst.
(1984), 17, 47-54] and Finger, Cox & Jephcoat [J. Appl. Cryst. (1994), 27,
892-900].