Ab initio study of the effect of doping on stacking faults in GaN

Citation
Ja. Chisholm et Pd. Bristowe, Ab initio study of the effect of doping on stacking faults in GaN, J CRYST GR, 230(3-4), 2001, pp. 432-437
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
230
Issue
3-4
Year of publication
2001
Pages
432 - 437
Database
ISI
SICI code
0022-0248(200109)230:3-4<432:AISOTE>2.0.ZU;2-3
Abstract
The influence of impurities on the basal plane stacking fault energy in GaN is investigated using density functional theory. It is found that silicon, indium, magnesium and carbon impurities each reduce the stacking fault ene rgy by introducing changes to the bonding properties of the material. These bonding properties are analysed in terms of Mulliken charges and bond popu lations. It is found that the reduction in stacking fault energy correlates both with a reduction in the average anion charge and with an increase in the overlap population. (C) 2001 Elsevier Science B.V. All rights reserved.