Polarization induced 2D hole gas in GaN/AlGaN heterostructures

Citation
S. Hackenbuchner et al., Polarization induced 2D hole gas in GaN/AlGaN heterostructures, J CRYST GR, 230(3-4), 2001, pp. 607-610
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
230
Issue
3-4
Year of publication
2001
Pages
607 - 610
Database
ISI
SICI code
0022-0248(200109)230:3-4<607:PI2HGI>2.0.ZU;2-1
Abstract
The generation of high density 2D hole gases is crucial for further progres s in the electronic and optoelectronic nitride devices. In this paper, we p resent systematic theoretical studies of Mg-doped GaN/AlGaN gated heterostr uctures and superlattices. Our calculations are based on a self-consistent solution of the multiband k.p Schrodinger and Poisson equation and reveal t hat the hole 2D sheet density is mainly determined by the polarization indu ced interface charges. For an aluminium concentration of 30%, the induced h ole density in the heterostructure can reach values up to 1.5 x 10(13) cm(- 2). In the GaN/AlGaN superlattices, the hole sheet density increases with t he superlattice period and saturates for a period of 40 nm at a value of 1. 5 x 10(13) cm(-2). (C) 2001 Elsevier Science B.V. All rights reserved.