Chemical vapor deposition of TBG: An alternative process for gas turbine components

This paper deals with the development of a new process for the deposition o f thermal barrier coatings (TBC) based on chemical vapor deposition. (CVD). The research program started in September 1998 under a BRITE/Euram III pro ject. The CVD process involves the evaporation of zirconium zirconium and y ttrium starting from metal-organic precursors and their reaction with oxyge n in a hot wall reactor in order to deposit TBC layers. The influence of di fferent deposition parameters such as evaporation temperature, pressure, an d substrate temperature an structure, deposition rate, and process yield ar e described The characterization of different precursors behavior is also d escribed. Preliminary results, obtained with optimized conditions, have sho wn ZrO2-Y2O3 columnar layers with deposition rates of interest from an indu strial point of view.