ELECTRON-SPIN ECHO INVESTIGATION FOR RADICALS PRODUCED ON ZNS SEMICONDUCTOR PHOTOCATALYSTS

Authors
NOSAKA Y NAKAOKA Y USHIDA K KIRA A
Citation
Y. Nosaka et al., ELECTRON-SPIN ECHO INVESTIGATION FOR RADICALS PRODUCED ON ZNS SEMICONDUCTOR PHOTOCATALYSTS, Chemistry Letters, (7), 1997, pp. 661-662
Citations number
6
Categorie Soggetti
Chemistry
Journal title
Chemistry Letters → ACNP
ISSN journal
03667022
Issue
7
Year of publication
1997
Pages
661 - 662
Database
ISI
SICI code
0366-7022(1997):7<661:EEIFRP>2.0.ZU;2-P
Abstract
Pulsed electron spin resonance technique was applied to the investigat ion into radicals formed on photo-irradiated ZnS semiconductor powder. From the decay profile of the signal intensity of electron spin echo, the spin relaxation times for surface holes and S-n radicals were mea sured to be 1.2 and 6 mu s, respectively.