XUV interferometry using high-order harmonics: Application to plasma diagnostics

Citation
Jf. Hergott et al., XUV interferometry using high-order harmonics: Application to plasma diagnostics, LASER PART, 19(1), 2001, pp. 35-40
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
LASER AND PARTICLE BEAMS
ISSN journal
02630346 → ACNP
Volume
19
Issue
1
Year of publication
2001
Pages
35 - 40
Database
ISI
SICI code
0263-0346(200103)19:1<35:XIUHHA>2.0.ZU;2-Z
Abstract
In this paper, we present and compare the two different XUV interferometric techniques using high-order harmonics that have been developed so far. The first scheme is based on the interference between two spatially separated phase-locked harmonic sources while the second uses two temporally separate d harmonic sources. These techniques have been applied to plasma diagnostic s in feasibility experiments where electron densities up to a few 10(20) e( -)/cm(3) have been measured with a temporal resolution of 200 fs. We presen t the main characteristics of each technique and discuss their respective p otentials and limitations.