Measurement of thicknesses of thin films by the Fourier spectrometry method

Citation
Gg. Gorbunov et al., Measurement of thicknesses of thin films by the Fourier spectrometry method, OPT SPECTRO, 90(6), 2001, pp. 887-890
Citations number
7
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
OPTICS AND SPECTROSCOPY
ISSN journal
0030400X → ACNP
Volume
90
Issue
6
Year of publication
2001
Pages
887 - 890
Database
ISI
SICI code
0030-400X(200106)90:6<887:MOTOTF>2.0.ZU;2-N
Abstract
A Fourier spectrometry method for measuring the thickness of thin and ultra thin films with the help of an additional peak that depends on the optical thickness of the deposited film and is situated outside the region of the c entral peak of the interferogram is proposed. The experiment demonstrates t he necessity of considering the change in optical path in the substrate tha t is induced by the deposited film. (C) 2001 MAIK "Nauka/Interperiodica".