Vacancy-hydrogen defects in silicon studied by Raman spectroscopy - art. no. 035204

Citation
Ev. Lavrov et al., Vacancy-hydrogen defects in silicon studied by Raman spectroscopy - art. no. 035204, PHYS REV B, 6403(3), 2001, pp. 5204
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
6403
Issue
3
Year of publication
2001
Database
ISI
SICI code
0163-1829(20010715)6403:3<5204:VDISSB>2.0.ZU;2-8
Abstract
A Raman study of hydrogen stretching modes in vacancy-hydrogen defects (VHn , n = 1,2,3,4) is presented. The positions of the vibrational modes are com pared to recent IR absorption results. The Raman lines exhibit pronounced p olarization due to the [111] orientation of the silicon-hydrogen bend. Base d on the defect symmetry derived from the polarization-dependent Raman sign als and the Raman intensities we assign the Raman lines to the defects VH4: 2234 cm(-1)(A(1) mode), 2205 cm(-1) (T-2 mode); V2H6: 2180 cm(-1) (A(1g), mode), 2155 cm(-1) (E-g mode). We tentatively attribute the 2120- and 2099- cm(-1) lines to VH2 and the 2022-cm(-1) line to VH.