Self-organized pattern formation in the oxidation of supported iron thin films. II. A simulation study - art. no. 035409

The process of oxidation of supported iron thin films is modeled by casting it into the form of an activator-inhibitor system, with precursor oxidatio n state as the activator, and stress produced by the large density differen ce between the metal and its oxide as a fast-diffusing inhibitor. An activa tor-substrate mechanism also coexists due to the finite availability of iro n. The redistribution of iron by diffusion via vacancies also indirectly co ntributes to the activation process. A slow process of ripening, which mini mizes surface energy, is suggested to convert the early leaflike pattern to a spiral assembly of hillocks. This model simulation yields patterns, whic h closely resemble the patterns observed in experiments reported by Shinde et al. [Phys. Rev. B 64, 035408 (2001)], in the accompanying Paper I.