A two magnetron sputter deposition chamber for in situ observation of thinfilm growth by synchrotron radiation scattering

The design of a sputter deposition chamber for the in situ study of film gr owth by synchrotron x-ray diffraction and reflectivity is reported. Four x- ray windows, sealed with low cost, nonhazardous Kapton, enable scattering b oth in the horizontal as well as in the vertical scattering planes. The cha mber fits into a standard six-circle goniometer from Huber which is relativ ely widespread in synchrotron laboratories. Two miniature magnetron and add itional gas inlets allow for the deposition of compound films or multilayer s. Substrate heating up to 650 degreesC and different substrate bias voltag e are possible. The performance of the chamber was tested with the depositi on of high quality TiN films of different thicknesses. (C) 2001 American In stitute of Physics.