The morphological evolution of an epitaxial film results from atomistic pro
cesses such as adatom motion and step-adatom interactions asserting their i
nfluence over the macroscopic length and time scales of the growth front. M
odelling epitaxial phenomena thus necessitates making a compromise between
the detailed information provided by first-principles methods and the compu
tational flexibility afforded by methods such as Monte-Carlo simulations an
d continuum equations of motion, in which atomistic processes are replaced
by coarse-grained effective kinetics. We will review the various approaches
that are available for modelling epitaxial phenomena using the (001) surfa
ces of III-V compound semiconductors as a case study, with a view to making
direct comparisons with experimental measurements and to establishing a me
thodology that is capable of incorporating all pertinent length and time sc
ales. Copyright (C) 2001 John Wiley & Sons, Ltd.