The formation and growth of Cu-Sn intermetallic film at the interface betwe
en molten Sn-Pb solders and Cu were studied at different temperature and ex
posure times. The eta -phase (CU6Sn5) was observed to form at all condition
s except at the lowest Sn level of 27 wt% and at the two highest temperatur
es of 290 and 310 degreesC. The epsilon -phase (Cu3Sn) was then obtained. A
t high Sn contents and short times, a cellular film with a rugged interface
was obtained which evolved into a compact film with a scalloped interface
as the Sn content decreased and exposure time increased. The epsilon -phase
film always formed with a relatively planar interface. The intermetallic g
rains showed preferred crystallographic orientations. Thickness measurement
s showed that the net growth rate depends not only on diffusion through the
film but also on the film dissolution. Precipitation of the eta -phase whi
skers was detected during cooling, particularly when the temperature was si
gnificantly high. (C) 2001 Acta Materialia Inc. Published by Elsevier Scien
ce Ltd. All rights reserved.