Ultrasensitive Si phototransistors with a punchthrough base

Citation
Hl. Luo et al., Ultrasensitive Si phototransistors with a punchthrough base, APPL PHYS L, 79(6), 2001, pp. 773-775
Citations number
4
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
6
Year of publication
2001
Pages
773 - 775
Database
ISI
SICI code
0003-6951(20010806)79:6<773:USPWAP>2.0.ZU;2-N
Abstract
Si phototransistors with a punchthrough base were fabricated with regular p lanar technology. Optical conversion gains larger than 15 000 were observed . In addition to very high gain, the unique structure of the device also re sulted in a fast transient response as well as low output noise. The measur ed full width at half maximum of the device transient response is 1.6 ns an d a -3 dB bandwidth of 300 MHz. The measured output noises at different cur rents can be well fitted by the relation i(n)((2) over bar)=2qI(C). (C) 200 1 American Institute of Physics.