Characteristics of ferroelectric Pb(Zr,Ti)O-3 thin films having Pt/PtOx electrode barriers

Citation
K. Lee et al., Characteristics of ferroelectric Pb(Zr,Ti)O-3 thin films having Pt/PtOx electrode barriers, APPL PHYS L, 79(6), 2001, pp. 821-823
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
6
Year of publication
2001
Pages
821 - 823
Database
ISI
SICI code
0003-6951(20010806)79:6<821:COFPTF>2.0.ZU;2-0
Abstract
We have investigated the feasibility of the Pt/PtOx multilayer as an electr ode barrier for Pb(Zr,Ti)O-3 (PZT)-based ferroelectric random access memori es. PtOx and Pt layers were prepared on polycrystalline-Si/SiO2/Si substrat es by means of the sputtering method in Ar and O-2 ambience, and the Pb(Zr0 .53Ti0.47)O-3 layer was prepared by the sol-gel method. A capacitor consist ing of Pt/PtOx/PZT/PtOx/Pt/PtOx/poly-Si had a remanent polarization of 18 m uC/cm(2) and a low coercive field of 32 kV/cm. The polarization fatigue beh avior of test capacitors was improved as compared with that of Pt/PZT/Pt, w hich showed negligible fatigue loss of 15% after 10(11) switching repetitio ns with a frequency of 1 MHz. (C) 2001 American Institute of Physics.