Comment on "High-resolution electron microscopy investigations on stackingfaults in SrBi2Ta2O9 ferroelectric thin films" [Appl. Phys. Lett. 78, 973 (2001)]

Authors
Zurbuchen, MA Schlom, DG Streiffer, SK
Citation
Ma. Zurbuchen et al., Comment on "High-resolution electron microscopy investigations on stackingfaults in SrBi2Ta2O9 ferroelectric thin films" [Appl. Phys. Lett. 78, 973 (2001)], APPL PHYS L, 79(6), 2001, pp. 887-888
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
6
Year of publication
2001
Pages
887 - 888
Database
ISI
SICI code
0003-6951(20010806)79:6<887:CO"EMI>2.0.ZU;2-M