Influence of the deposition conditions on the field emission properties ofpatterned nitrogenated carbon nanotube films

Citation
Jm. Bonard et al., Influence of the deposition conditions on the field emission properties ofpatterned nitrogenated carbon nanotube films, CHEM P LETT, 343(1-2), 2001, pp. 21-27
Citations number
21
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
343
Issue
1-2
Year of publication
2001
Pages
21 - 27
Database
ISI
SICI code
0009-2614(20010727)343:1-2<21:IOTDCO>2.0.ZU;2-K
Abstract
The electron field emission of patterned films of nitrogenated carbon nanot ubes is shown to be decisively influenced by the deposition conditions. The growth was carried out by decomposing methane in a nitrogen/ammonia atmosp here using hot filament chemical vapor deposition (CVD). The diameter of th e produced tubes depended critically on the distance between substrate and filament, and the field emission properties (applied fields needed for elec tron emission, field amplification factor) could be directly correlated to the film morphology. This demonstrates the possibility of tuning the field emission properties of such film emitters. For arrays of nanotubes thinner than 50 nm, the onset of field emission was observed at similar to4 V/mum, and a current density of 10 mA/cm(2) was obtained for an applied field of 7 .2 V/mu. (C) 2001 Elsevier Science B.V. All rights reserved.