Liquid source-MOCVD of BaxSr1-xTiO3 (BST) thin films with a N-alkoxy-beta-ketoiminato titanium complex

Authors
Min, YS Cho, YJ Kim, D Lee, JH Kim, BM Lim, SK Lee, IM Lee, WI
Citation
Ys. Min et al., Liquid source-MOCVD of BaxSr1-xTiO3 (BST) thin films with a N-alkoxy-beta-ketoiminato titanium complex, CHEM VAPOR, 7(4), 2001, pp. 146
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907 → ACNP
Volume
7
Issue
4
Year of publication
2001
Database
ISI
SICI code
0948-1907(200107)7:4<146:LSOB(T>2.0.ZU;2-U
Abstract
Communication: An N-alkoxy-beta -ketoiminato titanium complex, (Ti(2meiP)(2 ) (2meip 4-N-(2-methylethyoxy)imino-2-pentanoate), see Figure for molecular structure, was investigated as a Ti precursor for barium strontium titanat e (BST) thin film growth by liquid source metal-organic chemical vapor depo sition (LS-MOCVD). The BST films obtained have an ultra-smooth surface and the titanium composition is relatively independent of the deposition temper ature.